Organic ion yield enhancement in secondary ion mass spectrometry using water vapour injection. (15th May 2012)

• Record Type: Journal Article
• Authors: Mouhib, T.; Delcorte, A.; Poleunis, C.; Bertrand, P.
• Is Part Of: Surface and interface analysis. Volume 45:Number 1(2013:Jan.)
• Page Start: 46
• Page End: 49
• Publication Date: 2012-05-15
• Subjects: Surfaces (Physics) -- Periodicals; Surface chemistry -- Periodicals; Thin films -- Periodicals; 541.33
• DOI: 10.1002/sia.5043
• Languages: English
• ISSNs: 0142-2421

Abstract

<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The effects of water (H₂O) and deuterated water (D₂O) vapour, injected closely to the analyzed surface at relatively high pressure, on the enhancement of the ion yield in secondary ion mass spectrometry (SIMS) was investigated for a set of organic samples. The results show that the same signal enhancements occurred either upon Ga⁺ or C₆₀⁺ bombardment. In addition, the increase of H₂O vapour pressure during the bombardment causes a specific enhancement of the protonated ion intensity. For instance, the presence of H₂O vapour induces an enhancement by one order of magnitude of the [M + H]⁺ static SIMS intensity for the antioxidant Irgafos 168 and by more than two times for the amino acids. Copyright © 2012 John Wiley &amp; Sons, Ltd.</p> </abstract>