Cite
HARVARD Citation
Conard, T. et al. (n.d.). Degradation of deep ultraviolet photoresist by As‐implantation studied by Ar‐cluster beam profiling. Surface and interface analysis. pp. 406-408. [Online].
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Conard, T. et al. (n.d.). Degradation of deep ultraviolet photoresist by As‐implantation studied by Ar‐cluster beam profiling. Surface and interface analysis. pp. 406-408. [Online].