Chemical vapour deposition (CVD) : advances, technology, and applications /: advances, technology, and applications. ([2019])
- Record Type:
- Book
- Title:
- Chemical vapour deposition (CVD) : advances, technology, and applications /: advances, technology, and applications. ([2019])
- Main Title:
- Chemical vapour deposition (CVD) : advances, technology, and applications
- Further Information:
- Note: Edited by Kwang Leong Choy.
- Editors:
- Choy, Kwang-Leong
- Contents:
- Contents Preface xiii Editor xv Contributors xvii 1 Introduction Kwang Leong Choy and Cigang Xu 1.1 Chemical vapour deposition: Fundamentals and process principles 1 1.1.1 Definition 1 1.1.2 A brief history and development of CVD 2 1.1.3 Fundamentals and process principles 4 1.1.3.1 Thermodynamics/kinetics/mass transport of CVD 4 1.1.3.2 CVD precursors delivery, properties, and chemistry 8 1.1.3.3 CVD process parameters and control/monitoring to ensure reliability and reproducibility 12 1.2 Advances in CVD deposition technologies, growth of materials and applications 14 1.2.1 Large-area and high-volume production 15 1.2.2 Multiple functions 15 1.2.3 New materials and processes 15 1.3 Variant vacuum CVD methods 17 1.3.1 Vacuum-based methods 17 1.3.1.1 Plasma-enhanced CVD 17 1.3.1.2 Microwave-assisted CVD 20 1.3.1.3 Metalorganic CVD 23 1.3.1.4 Molecular-beam epitaxy 28 1.3.1.5 Chemical-beam epitaxy 34 1.3.1.6 Atomic layer deposition 37 1.3.1.7 Energetic ion-assisted CVD 43 1.3.1.8 Laser/photo-assisted CVD 49 1.3.2 Non-vacuum methods 51 1.3.2.1 Atmospheric pressure CVD 51 1.3.2.2 Atmospheric pressure MOCVD 58 1.3.2.3 Aerosol-assisted CVD 58 1.3.2.4 Electrostatic spray-assisted vapour deposition 62 1.3.2.5 Flame-assisted CVD 69 1.4 CVD of polymers 71 1.5 CVD modelling and simulation 76 1.6 CVD and its variants as tools for processing advanced materials to address energy, engineering, and biomedical grand challenges 80 1.6.1 Energy 80 1.6.2 Engineering 81 1.6.3 Biomedical 82 1.7Contents Preface xiii Editor xv Contributors xvii 1 Introduction Kwang Leong Choy and Cigang Xu 1.1 Chemical vapour deposition: Fundamentals and process principles 1 1.1.1 Definition 1 1.1.2 A brief history and development of CVD 2 1.1.3 Fundamentals and process principles 4 1.1.3.1 Thermodynamics/kinetics/mass transport of CVD 4 1.1.3.2 CVD precursors delivery, properties, and chemistry 8 1.1.3.3 CVD process parameters and control/monitoring to ensure reliability and reproducibility 12 1.2 Advances in CVD deposition technologies, growth of materials and applications 14 1.2.1 Large-area and high-volume production 15 1.2.2 Multiple functions 15 1.2.3 New materials and processes 15 1.3 Variant vacuum CVD methods 17 1.3.1 Vacuum-based methods 17 1.3.1.1 Plasma-enhanced CVD 17 1.3.1.2 Microwave-assisted CVD 20 1.3.1.3 Metalorganic CVD 23 1.3.1.4 Molecular-beam epitaxy 28 1.3.1.5 Chemical-beam epitaxy 34 1.3.1.6 Atomic layer deposition 37 1.3.1.7 Energetic ion-assisted CVD 43 1.3.1.8 Laser/photo-assisted CVD 49 1.3.2 Non-vacuum methods 51 1.3.2.1 Atmospheric pressure CVD 51 1.3.2.2 Atmospheric pressure MOCVD 58 1.3.2.3 Aerosol-assisted CVD 58 1.3.2.4 Electrostatic spray-assisted vapour deposition 62 1.3.2.5 Flame-assisted CVD 69 1.4 CVD of polymers 71 1.5 CVD modelling and simulation 76 1.6 CVD and its variants as tools for processing advanced materials to address energy, engineering, and biomedical grand challenges 80 1.6.1 Energy 80 1.6.2 Engineering 81 1.6.3 Biomedical 82 1.7 Advantages and limitations of CVD 83 1.8 Comparison of CVD with other processing techniques : Structure, properties, cost, sustainability, and versatility 84 1.9 Summary 89 Acknowledgement 89 References 89 2 Chemical vapour deposition of ultrafine particles 105 Cigang Xu and Kwang Leong Choy 2.1 Introduction 105 2.2 Processing, formation mechanism, structure, and properties 107 2.2.1 Processing methods using solid precursors 108 2.2.1.1 Condensation method 108 2.2.1.2 Laser-ablation method 109 2.2.1.3 Arc-discharge method 111 2.2.1.4 Reactive sputtering method 114 2.2.1.5 Ion-beam-based method 116 2.2.2 Processing methods using liquid or vapour precursors 119 2.2.2.1 Thermal CVD method 119 2.2.2.2 MOCVD method 120 2.2.2.3 Spray pyrolysis/ aerosol-assisted CVD 122 2.2.2.4 Flame synthesis 124 2.2.2.5 Flame spray pyrolysis 124 2.2.2.6 Laser pyrolysis 127 2.2.2.7 Plasma-based synthesis 128 2.2.2.8 MBE method 129 2.2.2.9 Ionisation method 131 2.2.2.10 Atomic layer deposition 131 2.2.3 Scale-up production 136 2.3 Scientific and technical issues and process control for producing high-performance nanoparticles for applications in structural, clean energy, biomedical, and environmental sectors 141 2.3.1 Structural applications 141 2.3.2 Clean energy 142 2.3.3 Biomedical applications 143 2.3.4 Environmental 144 2.4 Summary 146 References 146 3 CVD of nanowires and nanotubes, mass production, and industrialization 153 Cigang Xu and Kwang Leong Choy 3.1 Introduction 153 3.2 Preparation, structure, properties and applications of nanostructures 155 3.2.1 Carbon nanotubes 155 3.2.2 Si and Ge nanowires 166 3.2.3 III–V 1D nanomaterials 168 3.2.4 II–VI 1D nanomaterials 170 3.2.5 Oxides 171 3.2.6 Carbides 175 3.2.7 Nitrides 179 3.2.8 Elemental nanowires 184 3.2.9 Complex structures of 1D nanomaterial 185 3.2.10 Structural applications 196 3.2.11 Clean energy applications 197 3.2.12 Biomedical applications 200 3.2.13 Environmental applications 202 3.3 Scale-up prototype production and industrialization of nanowires and nanotubes 204 3.3.1 Scale-up prototype production of nanowires and nanotubes 204 3.3.1.1 Carbon nanotubes 204 3.3.1.2 Multi-walled carbon nanotubes 205 3.3.1.3 Bush-style MWNTs 207 3.3.1.4 Double-walled carbon nanotubes 207 3.3.1.5 Single-walled carbon nanotubes 211 3.3.1.6 Bush-style SWNTs 215 3.3.1.7 Other 1D materials 216 3.3.2 Industrialization of nanotubes 217 3.3.2.1 Industrialisation of multi-walled carbon nanotubes 218 3.3.2.2 Industrialisation of single-walled carbon nanotubes 221 3.3.2.3 Environment, health, and safety issues 223 3.3.2.4 Summary and outlook 224 References 225 4 CVD of flat monolayer of 2D atomics honeycomb structure and their applications 245 Manoj Kumar Singh, Dhananjay K. Sharma, Gonzalo Otero-Irurueta and María J. Hortigüela 4.1 Introduction 245 4.2 Graphene 246 4.2.1 Electronic structure of single-layer graphene 246 4.2.2 Graphene properties and synthesis 248 4.2.2.1 Graphene on single crystals grown under UHV conditions 248 4.2.2.2 Liquid phase exfoliation 249 4.2.2.3 Graphene on silicon carbide 250 4.2.2.4 Graphene by state-of-the-art technique chemical vapour deposition 252 4.2.3 From the laboratory to the industry 253 4.2.4 Quality comparison 257 4.2.5 Doping of graphene 258 4.3 Silicene 259 4.3.1 Electronic structure of silicene 260 4.3.2 Synthesis of silicene on surfaces 260 4.3.2.1 First synthesis of silicene on silver substrates 260 4.3.2.2 Silicene on other substrates 262 4.3.3 Controversy – discrepancies 262 4.3.4 From the laboratory to the industry 263 4.4 Germanene 263 4.4.1 Electronic structure of germanene 264 4.4.2 First synthesis of germanene on gold 265 4.4.3 Germanene on platinum 265 4.5 Conclusions 266 References 267 5 CVD of superlattice films and their applications 273 Guillaume Savelli 5.1 Introduction 273 5.1.1 Definitions 273 5.1.2 Superlattice band structures 274 5.1.3 Superlattices deposition techniques 275 5.2 CVD processing, deposition mechanisms, and structures 275 5.2.1 Superlattices processing steps 277 5.2.2 QWSL and QDSL deposition mechanisms 278 5.2.3 QWSL and QDSL structures 280 5.3 Main QWSL and QDSL properties 282 5.3.1 Mechanical properties 282 5.3.2 Electrical properties 282 5.3.3 Optical properties 283 5.3.4 Thermal properties 284 5.4 Applications 285 5.4.1 Photonics 285 5.4.1.1 Solar cells 286 5.4.1.2 Avalanche photodiodes 286 5.4.1.3 Inter-sub-band detectors 287 5.4.1.4 VCSEL 287 5.4.2 Optoelectronics 288 5.4.3 Thermoelectrics 288 5.4.4 Future prospects 290 References 291 6 CVD coatings 295 Kwang Leong Choy 6.1 Advanced protective coatings for cutting tools 295 6.2 Thermal barrier coatings (TBCS) 300 6.2.1 Conventional thermally assisted CVD 301 6.2.2 Plasma-assisted CVD 301 6.2.3 Laser-assisted CVD 301 6.2.4 Electrostatic spray-assisted vapour deposition (ESAVD) 303 6.3 Diffusion coatings 304 6.4 Thick silicon coatings 306 6.5 Thick metal coatings 307 6.6 Polymeric coatings 308 6.6.1 Applications 309 6.7 Fibre coatings and ceramic monofilament fibre production 311 6.7.1 Boron fibres 311 6.7.2 SiC fibres 313 6.7.3 Applications 314< … (more)
- Publisher Details:
- Boca Raton, FL : CRC Press/Taylor & Francis Group
- Publication Date:
- 2019
- Extent:
- 1 online resource
- Subjects:
- 620.1/15
Chemical vapor deposition
Nanostructured materials
SCIENCE / Physics
SCIENCE / Solid State Physics
TECHNOLOGY / Material Science
Chemical vapor deposition
Nanostructured materials
Electronic books - Languages:
- English
- ISBNs:
- 9780429342363
0429342365
9781000690736
1000690733
9781000691078
1000691071
9781000690903
1000690903 - Related ISBNs:
- 9781466597761
1466597763 - Notes:
- Note: Description based on online resource; title from digital title page (viewed on July 16, 2019).
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