Dry etching technology for semiconductors. ([2014])

• Record Type: Book
• Further Information: Note: Kazuo Nojiri.
• Authors: Nojiri, Kazuo
• Contents: Contribution of Dry Etching Technology to Progress of Semiconductor Integrated Circuit.- Mechanism of Dry Etching.- Dry Etching of Various Materials.- Dry Etching Equipments.- Dry Etching Damage.- Latest Dry Etching Technologies.- Future Challenges and Outlook for Dry Etching Technology.
• Publisher Details: Cham : Springer
• Publication Date: 2014
• Copyright Date: 2015
• Extent: 1 online resource (xiii, 116 pages), illustrations
• Subjects: 621.044; Engineering; Plasma etching; Semiconductors -- Etching; TECHNOLOGY & ENGINEERING -- Mechanical; Plasma etching; Semiconductors -- Etching; Technology & Engineering -- Electronics -- Circuits -- General; Technology & Engineering -- Electronics -- Semiconductors; Circuits & components; Semi-conductors & super-conductors; Systems engineering; Electronic books
• Languages: English
• ISBNs: 9783319102955; 3319102958
• Related ISBNs: 9783319102948
• Notes: Note: Includes bibliographical references.; Note: Online resource; title from PDF title page (SpringerLink, viewed November 10, 2014).
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.