Helium ion microscopy. (2016)

• Record Type: Book
• Further Information: Note: Gregor Hlawacek, Armin Gölzhäuser, editors.
• Editors: Hlawacek, Gregor; Gölzhäuser, Armin
• Contents: Preface; Contents; Contributors; Acronyms; Fundamentals; 1 The Helium Ion Microscope; Abstract; 1.1 Introduction; 1.2 The GFIS Gun; 1.3 Cryogenic Cooling; 1.4 Vacuum System; 1.5 Gas Delivery System; 1.6 The Ion Optical Column; 1.7 Beam Induced Damage; 1.8 Detectors and Signal Chain; 1.9 Vibrational Considerations; 1.10 Conclusion; References; 2 Single Atom Gas Field Ion Sources for Scanning Ion Microscopy; 2.1 Introduction; 2.2 FIM Details; 2.2.1 Anatomy of Gas-Assisted Etching; 2.2.2 Precursor Tip; 2.2.3 SAT Shaping; 2.2.4 SAT Reproducibility. 2.2.5 Air Exposure, Thermal Stability, and Faceting2.2.6 Iridium and Other Nanotip Materials; 2.3 Performance of SATs; 2.3.1 Best Imaging Voltage; 2.3.2 Temperature Dependence; 2.3.3 Shape Dependence; 2.3.4 Current Stability; 2.4 Conclusions; References; 3 Structural Changes in 2D Materials Due to Scattering of Light Ions; 3.1 Introduction; 3.2 The Scattering Process; 3.2.1 Elastic Scattering; 3.2.2 A Note on Inelastic Scattering; 3.3 Target Evolution Under Ion Impacts; 3.3.1 After the Binary Collision; 3.3.2 Molecular Dynamics Simulations of Ion Impacts on 2D Materials. 3.3.3 Influence of Multiple Impacts3.3.4 A Brief Note on the Substrate; 3.4 Results; 3.4.1 Graphene; 3.4.2 Experimental Results; 3.4.3 Other 2D Materials; 3.5 Summary; References; 4 Monte Carlo Simulations of Focused Ion Beam Induced Processing; 4.1 Introduction; 4.2 An Example of Monte Carlo Simulation: EnvizION Simulator; 4.2.1 Material Database; 4.2.2 Ion Beam Profile; 4.2.3 Nuclear Energy Loss; 4.2.4 Electronic Energy Loss and Stopping Cross-Section; 4.2.5 Ion and Recoil Trajectories; 4.2.6 Secondary Electrons; 4.2.7 Precursor Gas Handling; 4.2.8 Deposition and Etching. 4.2.9 Sputtering Algorithms4.3 Monte Carlo Simulations of Physical Sputtering; 4.3.1 Sputtering of Aluminum and Tungsten; 4.3.2 Sputtering of Copper; 4.4 EUV Mask Repair; 4.5 Resolution Limiting and Sputtering Limiting Effects; 4.6 Summary; References; 5 Secondary Electron Generation in the Helium Ion Microscope: Basics and Imaging; Abstract; 5.1 Introduction; 5.2 The Processes of Secondary Electron Generation in the Helium Ion Microscope; 5.3 SE Energy Distribution in HIM; 5.4 Imaging with SE; 5.4.1 Topographic Yield; 5.4.2 SE2/SE1 Ratio; 5.4.3 SE3. 5.4.4 Material Characterization by SE Contrast Measurements with Energy Filtering5.5 Imaging Utilizing a High SE Yield in HIM: Ion-to-SE Conversion; 5.5.1 Scanning Transmission Ion Microscopy (STIM) with SE Detector; 5.5.2 Reflection Ion Microscopy; 5.6 Summary; References; Microscopy; 6 Introduction to Imaging Techniques in the HIM; 6.1 Introduction; 6.2 Imaging Signals and Contrast Mechanisms; 6.2.1 Secondary Electrons; 6.2.2 Backscattered Ions; 6.2.3 Transmitted and Reflected Ions; 6.2.4 Photons; 6.3 HIM Imaging Techniques; 6.3.1 High Resolution Imaging; 6.3.2 Charge Neutralization.
• Publisher Details: Cham : Springer
• Publication Date: 2016
• Extent: 1 online resource (xxiii, 526 pages), color illustrations
• Subjects: 578.1; Physics; Field ion microscopy; Helium ions; Ion bombardment; NATURE -- Animals -- Wildlife; SCIENCE -- Microscopes & Microscopy; Field ion microscopy; Helium ions; Ion bombardment; Physics; Spectroscopy and Microscopy; Surfaces and Interfaces, Thin Films; Surface and Interface Science, Thin Films; Nanotechnology and Microengineering; Technology & Engineering -- Material Science; Science -- Solid State Physics; Technology & Engineering -- Nanotechnology & MEMS; Materials science; Condensed matter physics (liquid state & solid state physics); Precision instruments manufacture; Surfaces (Physics); Engineering; Science -- Spectroscopy & Spectrum Analysis; Spectrum analysis, spectrochemistry, mass spectrometry; Electronic books
• Languages: English
• ISBNs: 9783319419909; 3319419900; 3319419889; 9783319419886
• Related ISBNs: 9783319419886
• Notes: Note: Includes bibliographical references and index.; Note: Online resource; title from PDF title page (EBSCO, viewed March 31, 2017).
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.