X-ray metrology in semiconductor manufacturing. (2006)

• Record Type: Book
• Further Information: Note: D. Keith Bowen, Brian K. Tanner.
• Other Names: Bowen, D. Keith (David Keith), 1940-; Tanner, B. K (Brian Keith)
• Contents: Front Cover; Preface; Acknowledgments; About the Authors; Contents; 1. Introduction; 2. Thickness Metrology; 3. Composition and Phase Metrology; 4. Strain and Stress Metrology; 5. Mosaic Metrology; 6. Interface Roughness Metrology; 7. Porosity Metrology; 8. Specular X-ray Reflectivity; 9. X-ray Diffuse Scattering; 10. Theory of XRD on Polycrystals; 11. High-Resolution XRD on Single Crystals; 12. Diffraction Imaging and Defect Mapping; 13. Modeling and Analysis; 14. Instrumentation; 15. Accuracy and Precision of X-ray Metrology; Index.
• Publisher Details: Boca Raton : CRC/Taylor & Francis
• Publication Date: 2006
• Extent: 1 online resource (279 pages), illustrations
• Subjects: 621.3815/2; Fluroscopy; Integrated circuits -- Measurement; Semiconductor wafers -- Inspection; Semiconductors -- Design and construction -- Quality control; X-rays -- Diffraction; TECHNOLOGY & ENGINEERING -- Electronics -- Solid State; TECHNOLOGY & ENGINEERING -- Electronics -- Semiconductors; Integrated circuits -- Measurement; X-rays -- Diffraction; Electronic books
• Languages: English
• ISBNs: 0849339286; 9780849339288; 1420005650; 9781420005653
• Notes: Note: Includes bibliographical references and index.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.