Strain-engineered MOSFETs. (©2013)

• Record Type: Book
• Further Information: Note: C.K. Maiti, T.K. Maiti.
• Other Names: Maiti, C. K; Maiti, T. K
• Contents: 1. Introduction -- 2. Substrate-induced strain engineering in CMOS technology -- 3. Process-induced stress engineering in CMOS technology -- 4. Electronic properties of strain-engineered semiconductors -- 5. Strain-engineered MOSFETs -- 6. Noise in strain-engineered devices / C. Mukherjee -- 7. Technology CAD of strain-engineered MOSFETs -- 8. Reliability and degradation of strain-engineered MOSFETs -- 9. Process compact modelling of strain-engineered MOSFETs -- 10. Process-aware design of strain-engineered MOSFETs -- 11. Conclusions.
• Publisher Details: Boca Raton, FL : Taylor & Francis
• Publication Date: 2013
• Copyright Date: 2013
• Extent: 1 online resource
• Subjects: 621.3815/284; Metal oxide semiconductor field-effect transistors -- Reliability; Integrated circuits -- Fault tolerance; Strains and stresses; Integrated circuits -- Fault tolerance; Metal oxide semiconductor field-effect transistors -- Reliability; Strains and stresses; TECHNOLOGY & ENGINEERING -- Electronics -- Circuits -- General; TECHNOLOGY & ENGINEERING -- Electronics -- Microelectronics; TECHNOLOGY & ENGINEERING -- Material Science; TECHNOLOGY & ENGINEERING -- Electronics -- Transistors; Electronic books
• Languages: English
• ISBNs: 9781466503472; 1466503475
• Related ISBNs: 9781466500556; 1466500557
• Notes: Note: Includes bibliographical references and index.; Note: Print version record.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.