Spacer engineered FinFET architectures : high-performance digital circuit applicators /: high-performance digital circuit applicators. (2017)

• Record Type: Book
• Further Information: Note: Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal.
• Authors: Dasgupta, Sudeb; Kaushik, Brajesh Kumar; Pal, Pankaj Kumar
• Contents: Introduction to nanoelectronics -- Tri-gate FinFET technology and its advancement -- Dual-K spacer device architectures and its electrostatics -- Capacitive analysis & dual-K FinFET based digital circuit design -- Design metric improvement of dual-K based SRAM cell -- Statistical variability & sensitivity analysis.
• Publisher Details: Boca Raton : Taylor & Francis, CRC Press
• Publication Date: 2017
• Extent: 1 online resource
• Subjects: 621.3815/284; TECHNOLOGY & ENGINEERING / Electronics / Microelectronics; Metal oxide semiconductor field-effect transistors; Silicon-on-insulator technology; Metal oxide semiconductor field-effect transistors; Silicon-on-insulator technology; TECHNOLOGY & ENGINEERING / Mechanical; TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS; Electronic books
• Languages: English
• ISBNs: 9781351751049; 1351751042
• Related ISBNs: 9781498783590; 1498783597; 9781315191089
• Notes: Note: Includes bibliographical references.; Note: Print version record.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.