Plasma etching processes for CMOS devices realization. (2017)
- Record Type:
- Book
- Title:
- Plasma etching processes for CMOS devices realization. (2017)
- Main Title:
- Plasma etching processes for CMOS devices realization
- Further Information:
- Note: Edited by Nicolas Posseme.
- Editors:
- Posseme, Nicolas
- Contents:
- 1. CMOS Devices Through the Years by Maud Vinet and Nicolas Posseme 2. Plasma Etching in Microelectronics by Maxime Darnon 3. Patterning Challenges in Microelectronics by Sébastien Barnola, Nicolas Posseme, Stefan Landis and Maxime Darnon 4. Plasma Etch Challenges for Gate Patterning by Maxime Darnon and Nicolas Posseme
- Publisher Details:
- Amsterdam : Elsevier
- Publication Date:
- 2017
- Extent:
- 1 online resource
- Subjects:
- 621.39732
Metal oxide semiconductors, Complementary -- Design and construction
Plasma etching - Languages:
- English
- ISBNs:
- 9780081011966
- Related ISBNs:
- 9781785480966
- Notes:
- Note: Description based on CIP data; item not viewed.
- Access Rights:
- Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
- Access Usage:
- Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library HMNTS - ELD.DS.206514
- Ingest File:
- 02_247.xml