Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO : Application to Displays /: Application to Displays. (2016)
- Record Type:
- Book
- Title:
- Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO : Application to Displays /: Application to Displays. (2016)
- Main Title:
- Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO : Application to Displays
- Further Information:
- Note: Shunpei Yamazaki, Tetsuo Tsutsui.
- Editors:
- Yamazaki, Shunpei
Tsutsui, Tetsuo - Contents:
- About the Editors Notes on contributors Series editor's foreword Preface Acknowledgements 1 Introduction 1.1 History of Displays 1.2 Requirement for Displays 1.3 Transistor Technology for Displays 1.3.1 Comparison of Silicon and Oxide Semiconductors 1.3.2 FETs in LCDs 1.3.3 FETs in OLED Displays 1.3.4 Recent CAAC-IGZO FET Technologies 1.3.5 Development of OLED Displays Using CAAC-IGZO 2 Applications of CAAC-IGZO FETs to Displays 2.1 Introduction 2.2 Bottom-gate Top-contact FET 2.2.1 Manufacturing Process for CAAC-IGZO FETs with Channel-etch Type of BGTC Structure 2.2.2 GI Formation 2.2.3 Formation of Buried Channel by Stacked Active Layer IGZO 2.2.4 Baking Treatment of CAAC-IGZO 2.2.5 Damaged Layer (n -type) Formed by Deposition of S/D Electrodes 2.2.6 Cleaning of the Back Channel 2.2.7 Copper Wiring for S/D Electrodes 2.3 Top-gate Self-aligned FET 2.3.1 Fabrication Process of TGSA CAAC-IGZO FETs 2.3.2 Formation of GE/GI Patterns 2.3.3 Formation of S/D Regions 2.3.4 GI Thinning and L Reduction 2.4 Characteristics of CAAC-IGZO FET 2.4.1 Current Drivability 2.4.2 Low Off-state Current 2.4.3 Normally-off I d -V d Characteristics and Small Threshold-voltage Variation 2.4.4 Saturability of I d -V d Characteristics 2.4.5 Summary 2.5 Density of States and Device Reliability 2.5.1 Introduction 2.5.2 Measurement of Defect States in IGZO Film 2.5.3 Correlation between Oxygen Vacancies and FET Characteristics 2.5.4 Defect States in Silicon Oxide Film 2.5.5 NBIS Mechanism 2.5.6 SummaryAbout the Editors Notes on contributors Series editor's foreword Preface Acknowledgements 1 Introduction 1.1 History of Displays 1.2 Requirement for Displays 1.3 Transistor Technology for Displays 1.3.1 Comparison of Silicon and Oxide Semiconductors 1.3.2 FETs in LCDs 1.3.3 FETs in OLED Displays 1.3.4 Recent CAAC-IGZO FET Technologies 1.3.5 Development of OLED Displays Using CAAC-IGZO 2 Applications of CAAC-IGZO FETs to Displays 2.1 Introduction 2.2 Bottom-gate Top-contact FET 2.2.1 Manufacturing Process for CAAC-IGZO FETs with Channel-etch Type of BGTC Structure 2.2.2 GI Formation 2.2.3 Formation of Buried Channel by Stacked Active Layer IGZO 2.2.4 Baking Treatment of CAAC-IGZO 2.2.5 Damaged Layer (n -type) Formed by Deposition of S/D Electrodes 2.2.6 Cleaning of the Back Channel 2.2.7 Copper Wiring for S/D Electrodes 2.3 Top-gate Self-aligned FET 2.3.1 Fabrication Process of TGSA CAAC-IGZO FETs 2.3.2 Formation of GE/GI Patterns 2.3.3 Formation of S/D Regions 2.3.4 GI Thinning and L Reduction 2.4 Characteristics of CAAC-IGZO FET 2.4.1 Current Drivability 2.4.2 Low Off-state Current 2.4.3 Normally-off I d -V d Characteristics and Small Threshold-voltage Variation 2.4.4 Saturability of I d -V d Characteristics 2.4.5 Summary 2.5 Density of States and Device Reliability 2.5.1 Introduction 2.5.2 Measurement of Defect States in IGZO Film 2.5.3 Correlation between Oxygen Vacancies and FET Characteristics 2.5.4 Defect States in Silicon Oxide Film 2.5.5 NBIS Mechanism 2.5.6 Summary 2.6 Oxide Conductor Electrode Process 2.6.1 Introduction 2.6.2 Method of Fabricating Oxide Conductor Electrode and Measurements of Its Resistivity 2.6.3 Liquid Crystal Display Device with Oxide Conductor Electrode 2.6.4 Summary 3 Driver Circuit 3.1 Introduction 3.2. Gate-driver Circuit 3.2.1 Logic Circuit and Bootstrapping 3.2.2 Flip-flops 3.2.3 Reduction in Area of Gate-driver Circuit 3.3 Source-driver Circuit 3.3.1 Introduction 3.3.2 Demultiplexer 3.3.3 8-bit Source-driver IC for 13.3-inch 60-Hz 8-bit 8K OLED Panels 3.3.4 12-bit Source-driver IC for 13.3-inch 120-Hz 12-bit 8K OLED Panels 3.3.5 Full-driver IC 4 Application to OLED Displays 4.1 Introduction 4.2 Device Architecture for High Performance OLED 4.2.1 Fundamentals of OLED 4.2.2 Organic Material/Metal Oxide Composite (OMOx) 4.2.3 Exciplex–triplet Energy Transfer (ExTET) for High-performance Phosphorescent OLED 4.2.4 Enhancement in Emission Efficiency of Fluorescent OLEDs 4.2.5 Increase in Outcoupling Efficiency of OLED by Molecular Orientation 4.3 OLED Structure for Higher Pixel Density 4.3.1 Tandem OLED 4.3.2 White-tandem OLED, Top Emission, and Color Filter (WTC) Structure 4.3.3 Measures for Crosstalk 4.4 Circuit Design for OLED Displays 4.4.1 Driving OLED Displays 4.4.2 External Compensation 4.4.3 Internal Compensation 4.4.4 Arrangement of Pixel Circuit and High Resolution 4.5 Characteristics of OLED displays 4.5.1 Applications of White-tandem OLED, Top Emission, and Color Filter (WTC) Structure to Displays 4.5.2 Performance of OLED and Liquid Crystal Displays 5 Flexible Displays 5.1 Introduction 5.1.1 OLED and Flexible Displays 5.2 Flexible Display Fabrication Technology 5.2.1 Separation Layer 5.2.2 Separation Process 5.2.3 Transfer Process of Flexible Displays 5.2.4 Moisture Blocking Property of the Flexible OLED Display 5.2.5 Bending Test 5.2.6 System Automation by Transfer Technology Apparatus (TT Apparatus) 5.3 Prototypes of Flexible OLED Displays 6 Application to Liquid Crystal Displays 6.1 Introduction 6.2 Technology for Higher Resolution 6.2.1 Introduction 6.2.2 The Pixel Circuit 6.2.3 Pixel Layout and Aperture Ratio of an LCD 6.2.4 Applicability of Large-sized Displays 6.3 Driving Method for Power Saving 6.3.1 Introduction 6.3.2 Saving Power with Low-frequency Driving 6.3.3 Low-frequency Driving with CAAC-IGZO 6.3.4 Configuration of a Liquid Crystal Cell for Low-frequency Driving 6.3.5 Conclusions 6.4 Characteristics of Liquid Crystal Displays 6.4.1 Introduction 6.4.2 High-Resolution Fringe-field Switching Liquid Crystal Displays 6.4.3 A 434-PPI Reflective Liquid Crystal Display Appendix Unit Prefix FET Symbol … (more)
- Publisher Details:
- United Kingdom : Wiley
- Publication Date:
- 2016
- Extent:
- 1 online resource (432 pages)
- Subjects:
- 621.3815/2
Semiconductors -- Materials
Semiconductors -- Characterization
Gallium compounds
Electroluminescent display systems -- Materials
Electronic books - Languages:
- English
- ISBNs:
- 9781119247395
9781119247487
1119247489 - Related ISBNs:
- 111924739X
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- Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
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- Physical Locations:
- British Library HMNTS - ELD.DS.100371
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