Materials science of thin films : deposition and structure /: deposition and structure. (2002)

• Record Type: Book
• Further Information: Note: Milton Ohring.
• Other Names: Ohring, Milton, 1936-
• Contents: Foreword to First Edition -- Preface -- Acknowledgments -- A Historical Perspective -- Chapter 1 A Review of Materials Science -- 1.1. Introduction -- 1.2. Structure -- 1.3. Defects in Solids -- 1.4. Bonds and Bands in Materials -- 1.5. Thermodynamics of Materials -- 1.6. Kinetics -- 1.7. Nucleation -- 1.8. An Introduction to Mechanical Behavior -- 1.9. Conclusion -- Exercises -- References -- Chapter 2 Vacuum Science and Technology -- 2.1. Introduction -- 2.2. Kinetic Theory of Gases -- 2.3. Gas Transport and Pumping -- 2.4. Vacuum Pumps -- 2.5. Vacuum Systems -- 2.6. Conclusion -- Exercises -- References -- Chapter 3 Thin-Film Evaporation Processes -- 3.1. Introduction -- 3.2. The Physics and Chemistry of Evaporation -- 3.3. Film Thickness Uniformity and Purity -- 3.4. Evaporation Hardware -- 3.5. Evaporation Processes and Applications -- 3.6. Conclusion -- Exercises -- References -- Chapter 4 Discharges, Plasmas, and Ion-Surface Interactions -- 4.1. Introduction -- 4.2. Plasmas, Discharges, and Arcs -- 4.3. Fundamentals of Plasma Physics -- 4.4. Reactions in Plasmas -- 4.5. Physics of Sputtering -- 4.6. Ion Bombardment Modification of Growing Films -- 4.7. Conclusion -- Exercises -- References -- Chapter 5 Plasma and Ion Beam Processing of Thin Films -- 5.1. Introduction -- 5.2. DC, AC, and Reactive Sputtering Processes -- 5.3. Magnetron Sputtering -- 5.4. Plasma Etching -- 5.5. Hybrid and Modified PVD Processes -- 5.6. Conclusion -- Exercises -- References -- Chapter 6 Chemical Vapor Deposition -- 6.1. Introduction -- 6.2. Reaction Types -- 6.3. Thermodynamics of CVD -- 6.4. Gas Transport -- 6.5. Film Growth Kinetics -- 6.6. Thermal CVD Processes -- 6.7. Plasma-Enhanced CVD Processes -- 6.8. Some CVD Materials Issues -- 6.9. Safety -- 6.10. Conclusion -- Exercises -- References -- Chapter 7 Substrate Surfaces and Thin-Film Nucleation -- 7.1. Introduction -- 7.2. An Atomic View of Substrate Surfaces -- 7.3. Thermodynamic Aspects of Nucleation -- 7.4. Kinetic Processes in Nucleation and Growth -- 7.5. Experimental Studies of Nucleation and Growth -- 7.6. Conclusion -- Exercises -- References -- Chapter 8 Epitaxy -- 8.1. Introduction -- 8.2. Manifestations of Epitaxy -- 8.3. Lattice Misfit and Defects in Epitaxial Films -- 8.4. Epitaxy of Compound Semiconductors -- 8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films -- 8.6. Low-Temperature Methods for Depositing Epitaxial Semiconductor Films -- 8.7. Mechanisms and Characterization of Epitaxial Film Growth -- 8.8. Conclusion -- Exercises -- References -- Chapter 9 Film Structure -- 9.1. Introduction -- 9.2. Structural Morphology of Deposited Films and Coatings -- 9.3. Computational Simulations of Film Structure -- 9.4. Grain Growth, Texture, and Microstructure Control in Thin Films -- 9.5. Constrained Film Structures -- 9.6. Amorphous Thin Films -- 9.7. Conclusion -- Exercises -- References -- Chapter 10 Characterization of Thin Films and Surfaces -- 10.1. Introduction -- 10.2. Film Thickness -- 10.3. Structural Characterization of Films and Surfaces -- 10.4. Chemical Characterization of Surfaces and Films -- 10.5. Conclusion -- Exercises -- References -- Chapter 11 Interdiffusion, Reactions, and Transformations in Thin Films -- 11.1. Introduction -- 11.2. Fundamentals of Diffusion -- 11.3. Interdiffusion in Thin Metal Films -- 11.4. Compound Formation and Phase Transformations in Thin Films -- 11.5. Metal-Semiconductor Reactions -- 11.6. Mass Transport in Thin Films under Large Driving Forces -- 11.7. Conclusion -- Exercises -- References -- Chapter 12 Mechanical Properties of Thin Films -- 12.1. Introduction -- 12.2. Mechanical Testing and Strength of Thin Films -- 12.3. Analysis of Internal Stress -- 12.4. Techniques for Measuring Internal Stress in Films -- 12.5. Internal Stresses in Thin Films and Their Causes -- 12.6. Mechanical Relaxation Effects in Stressed Films -- 12.7. Adhesion -- 12.8. Conclusion -- Exercises -- References -- Index. A review of materials science -- Vacuum science and technology -- Thin-film evaporation processes -- Discharges, plasmas, and ion-surface interactions -- Plasma and ion beam processing of thin films -- Chamical vapor deposition -- Substrate surfaces and thin-film nucleation -- Epitaxy -- Film structure -- Characterixation of thin films and surfaces -- Interdiffusion, reactions, and transformations in thin films -- Mechanical properties of thin films.
• Edition: 2nd ed
• Publisher Details: San Diego, CA : Academic Press
• Publication Date: 2002
• Extent: 1 online resource (xxi, 794 pages), illustrations
• Subjects: 621.3815/2; Thin films; Thin films; Couches minces; TECHNOLOGY & ENGINEERING -- Electronics -- Solid State; TECHNOLOGY & ENGINEERING -- Electronics -- Semiconductors; Thin films; Electronic books
• Languages: English
• ISBNs: 0585470979; 9780585470979; 9780080491783; 0080491782
• Related ISBNs: 9780125249751; 0125249756
• Notes: Note: Includes bibliographical references and index.; Note: Print version record.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.