Plasma etching processes for interconnect realization in VLSI. (2015)
- Record Type:
- Book
- Title:
- Plasma etching processes for interconnect realization in VLSI. (2015)
- Main Title:
- Plasma etching processes for interconnect realization in VLSI
- Further Information:
- Note: Edited by Nicolas Posseme.
- Editors:
- Posseme, Nicolas
- Contents:
- I. Introduction; II. Interaction Plasma / Dielectric; III. Porous SiOCH film integration; IV. Interconnects for tomorrow; V. References
- Publisher Details:
- Amsterdam : Elsevier
- Publication Date:
- 2015
- Extent:
- 1 online resource
- Subjects:
- 621.381531
Very high speed integrated circuits -- Design and construction
Plasma etching - Languages:
- English
- ISBNs:
- 9780081005903
- Related ISBNs:
- 9781785480157
- Notes:
- Note: Description based on CIP data; item not viewed.
- Access Rights:
- Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
- Access Usage:
- Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library HMNTS - ELD.DS.32368
- Ingest File:
- 02_188.xml