1. Foundations of atomic-level plasma processing in nanoelectronics. (1st October 2022) Authors: Arts, Karsten; Hamaguchi, Satoshi; Ito, Tomoko; Karahashi, Kazuhiro; Knoops, Harm C M; Mackus, Adriaan J M; (Erwin) Kessels, Wilhelmus M M Journal: Plasma sources science & technology Issue: Volume 31:Number 10(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗