1. Double layer lift-off nanofabrication controlled gaps of nanoelectrodes with sub-100 nm by nanoimprint lithography. (15th April 2015) Authors: Wang, Shujie; Shi, Qing; Chai, Jing; Cheng, Ke; Du, Zuliang Journal: Nanotechnology Issue: Volume 26:Number 18(2015) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗