1. Changes in TCR of amorphous Ni–P resistive films as a function of thermal stabilization parameters. Issue 3 (29th July 2014) Authors: Kowalik, P.; Pruszowski, Z.; Kulawik, J.; Czerwiński, Andrzej; Pluska, Mariusz Editors: Agata Skwarek, Dr Journal: Microelectronics international Issue: Volume 31:Issue 3(2014) Page Start: 149 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Changes in TCR of amorphous Ni–P resistive films as a function of thermal stabilization parameters. Issue 3 (4th August 2014) Authors: Kowalik, P.; Pruszowski, Z.; Kulawik, J.; Czerwiński, Andrzej; Pluska, Mariusz Editors: Agata Skwarek, Dr Journal: Microelectronics international Issue: Volume 31:Issue 3(2014) Page Start: 149 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗