1. Damage-free finishing of Lu2O3 by combining plasma-assisted etching and low-pressure polishing. Issue 1 (2022) Authors: Lyu, Peng; Lai, Min; Liu, Ze; Fang, Fengzhou Journal: CIRP annals Issue: Volume 71:Issue 1(2022) Page Start: 169 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗