1. Performance of thin AlxOy, SixNy and AlN passivation layers for high temperature SAW device applications. (July 2018) Authors: Gillinger, M.; Knobloch, T.; Marković, A.; Pfusterschmied, G.; Schneider, M.; Schmid, U. Journal: Materials science in semiconductor processing Issue: Volume 81(2018) Page Start: 1 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗