1. Preparation optimization of ATO particles by robust parameter design. (February 2016) Authors: An, Qi; Bai, Genghua; Yang, Yang; Wang, Cui; Huang, Quehong; Liu, Chao; Chen, Shujun; Cao, Jun; Zheng, Sisi; Gu, Zhengui; Xiang, Bin Journal: Materials science in semiconductor processing Issue: Volume 42:Part 3(2016:Feb.) Page Start: 354 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗