1. Atomic layer deposition of molybdenum oxide using (NtBu)2(NMe2)2Mo, hydrogen peroxide (H2O2), and ozone (O3) for DRAM application. Issue 3 (1st February 2023) Authors: Lee, Seunghwan; Yang, Hae Lin; Kim, Beomseok; Lee, Jinho; Lim, Hanjin; Park, Jin-Seong Journal: Ceramics international Issue: Volume 49:Issue 3(2023) Page Start: 5292 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗