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Subject Microelectronics - Semiconductor Processing -- Corrosion inhibitor -- Particle removal -- Post-CMP

1. Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning. (1st January 2019)

Authors:
Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo
Journal:
ECS journal of solid state science and technology
Issue:
Volume 8:Number 5(2019)
Page Start:
P3058
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

2. Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning. (20th February 2019)

Authors:
Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo
Journal:
ECS journal of solid state science and technology
Issue:
Volume 8:Number 5(2019)
Page Start:
P3058
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

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