1. Learning process patterns via multiple sequence alignment. (March 2022) Authors: Zheng, Chenglin; Chen, Xi; Zhang, Tong; Sahinidis, Nikolaos V.; Siirola, Jeffrey J. Journal: Computers & chemical engineering Issue: Volume 159(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗