1. Effect of thermal annealing on the interface quality of Ge/Si heterostructures. (September 2019) Authors: Arroyo, Rojas Dasilva; Isa, Fabio; Isella, Giovanni; Erni, Rolf; von Känel, Hans; Gröning, Pierangelo; Rossell, Marta D. Journal: Scripta materialia Issue: Number 170(2019) Page Start: 52 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗