1. MOCVD of CeO2 and SiO2 Mixture Films Using Alkoxy Sources. (1st January 2015) Authors: Matsumura, T.; Furuya, T.; Sato, T.; Okabe, Y.; Suzuki, S.; Ishibashi, K.; Yamamoto, Y. Journal: ECS Solid State Letters Issue: Volume 4:Number 12(2015) Page Start: N17 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. MOCVD of CeO2 and SiO2 Mixture Films Using Alkoxy Sources. (23rd September 2015) Authors: Matsumura, T.; Furuya, T.; Sato, T.; Okabe, Y.; Suzuki, S.; Ishibashi, K.; Yamamoto, Y. Journal: ECS Solid State Letters Issue: Volume 4:Number 12(2015) Page Start: N17 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗