1. Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography. (29th March 2016) Authors: Schnauber, Peter; Schmidt, Ronny; Kaganskiy, Arsenty; Heuser, Tobias; Gschrey, Manuel; Rodt, Sven; Reitzenstein, Stephan Journal: Nanotechnology Issue: Volume 27:Number 19(2016) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗