1. HfO2 thin film formed by solution-coating method and application to resistive switching device. (7th January 2021) Authors: Ban, Takahiko; Matsumura, Ryota; Yamamoto, Shin-ichi Journal: Japanese journal of applied physics Issue: Volume 60:Number 1(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. HfO2 thin film formed by solution-coating method and application to resistive switching device. (7th January 2021) Authors: Ban, Takahiko; Matsumura, Ryota; Yamamoto, Shin-ichi Journal: Japanese journal of applied physics Issue: Volume 60:Number 1(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗