1. Soft Graphoepitaxy for Large Area Directed Self‐Assembly of Polystyrene‐block‐Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography. (27th April 2015) Authors: Borah, Dipu; Rasappa, Sozaraj; Salaun, Mathieu; Zellsman, Marc; Lorret, Olivier; Liontos, George; Ntetsikas, Konstantinos; Avgeropoulos, Apostolos; Morris, Michael A. Journal: Advanced functional materials Issue: Volume 25:Number 22(2015) Page Start: 3425 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗