1. Electrochemical Polishing of Tungsten: An Investigation of Critical Spatial Frequency and Ultimate Roughness. Issue 4 (1st April 2022) Authors: Jianwei, Ji; Ajmal, Khan Muhammad; Zejin, Zhan; Rong, Yi; Hui, Deng Journal: Journal of the Electrochemical Society Issue: Volume 169:Issue 4(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗