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2. Impact of Deposition Temperature on Crystal Structure and Ferroelectric Properties of (Al1−xScx)N Films Prepared by Sputtering Method. Issue 17 (8th September 2021)

4. Thickness scaling of (Al0.8Sc0.2)N films with remanent polarization beyond 100 μC cm−2 around 10 nm in thickness. (13th September 2021)