1. A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films. Issue 89 (16th October 2020) Authors: Boysen, Nils; Misimi, Bujamin; Muriqi, Arbresha; Wree, Jan-Lucas; Hasselmann, Tim; Rogalla, Detlef; Haeger, Tobias; Theirich, Detlef; Nolan, Michael; Riedl, Thomas; Devi, Anjana Journal: Chemical communications Issue: Volume 56:Issue 89(2020) Page Start: 13752 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. A new metalorganic chemical vapor deposition process for MoS2 with a 1, 4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur. Issue 38 (23rd September 2020) Authors: Wree, Jan-Lucas; Ciftyurek, Engin; Zanders, David; Boysen, Nils; Kostka, Aleksander; Rogalla, Detlef; Kasischke, Maren; Ostendorf, Andreas; Schierbaum, Klaus; Devi, Anjana Journal: Dalton transactions Issue: Volume 49:Issue 38(2020) Page Start: 13462 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors. Issue 14 (22nd March 2022) Authors: Kaur, Parmish; Muriqi, Arbresha; Wree, Jan-Lucas; Ghiyasi, Ramin; Safdar, Muhammad; Nolan, Michael; Karppinen, Maarit; Devi, Anjana Journal: Dalton transactions Issue: Volume 51:Issue 14(2022) Page Start: 5603 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Nucleation and growth studies of large-area deposited WS2 on flexible substrates. (1st November 2022) Authors: Berning, Thomas; Becher, Malte; Wree, Jan-Lucas; Jagosz, Julia; Kostka, Aleksander; Ostendorf, Andreas; Devi, Anjana; Bock, Claudia Journal: Materials research express Issue: Volume 9:Number 11(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal–organic chemical vapour deposition. Issue 32 (23rd July 2021) Authors: Wree, Jan-Lucas; Glauber, Jean-Pierre; Öhl, Denis; Niesen, Alessia; Kostka, Aleksander; Rogalla, Detlef; Schuhmann, Wolfgang; Devi, Anjana Journal: Journal of materials chemistry Issue: Volume 9:Issue 32(2021) Page Start: 10254 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗