1. QDB: a new database of plasma chemistries and reactions. (4th April 2017) Authors: Tennyson, Jonathan; Rahimi, Sara; Hill, Christian; Tse, Lisa; Vibhakar, Anuradha; Akello-Egwel, Dolica; Brown, Daniel B; Dzarasova, Anna; Hamilton, James R; Jaksch, Dagmar; Mohr, Sebastian; Wren-Little, Keir; Bruckmeier, Johannes; Agarwal, Ankur; Bartschat, Klaus; Bogaerts, Annemie; Booth, Jean-P... Journal: Plasma sources science & technology Issue: Volume 26:Number 5(2017:Oct.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. (Invited) Challenges for Etch Technology and the Integration of New Channel Materials Beyond 7 nm. (27th April 2017) Authors: Ranjan, Alok; Rastogi, Vinayak; Ventzek, Peter Journal: ECS transactions Issue: Volume 77:Number 6(2017) Page Start: 67 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. (Invited) Control of Atomic Layer Reactions in Plasma Processing. (16th August 2016) Authors: Ventzek, Peter; Sherpa, S D; Wang, M; Rastogi, V; Ranjan, Alok Journal: ECS transactions Issue: Volume 75:Number 6(2016) Page Start: 25 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗