1. Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition. (16th October 2019) Authors: Chen, Hua-Hsuan; Toko, Susumu; Ohori, Daisuke; Ozaki, Takuya; Utsuno, Mitsuya; Kubota, Tomohiro; Nozawa, Toshihisa; Samukawa, Seiji Journal: Journal of physics Issue: Volume 53:Number 1(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗