1. Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVD. (1st January 2015) Authors: Tu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 1(2015) Page Start: N3015 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVD. (2nd October 2014) Authors: Tu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 1(2015) Page Start: N3015 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗