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Author/Creator Tseng, Ching-Lin

1. Improved Process Stability on an Extremely Thin Amorphous/Crystalline Silicon Interface Passivation Layer by Using Predeposition on the Chamber Wall. (1st January 2018)

Authors:
Hsieh, Yu-Lin; Tseng, Ching-Lin; Lee, Chien-Chieh; Fuh, Yiin-Kuen; Chang, Jenq-Yang; Lee, Ju-Yi; Li, Tomi T.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 7:Number 8(2018)
Page Start:
P355
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

2. Improved Process Stability on an Extremely Thin Amorphous/Crystalline Silicon Interface Passivation Layer by Using Predeposition on the Chamber Wall. (4th July 2018)

Authors:
Hsieh, Yu-Lin; Tseng, Ching-Lin; Lee, Chien-Chieh; Fuh, Yiin-Kuen; Chang, Jenq-Yang; Lee, Ju-Yi; Li, Tomi T.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 7:Number 8(2018)
Page Start:
P355
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

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