1. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Issue 5 (11th January 2016) Authors: Gebhard, M.; Mitschker, F.; Wiesing, M.; Giner, I.; Torun, B.; de los Arcos, T.; Awakowicz, P.; Grundmeier, G.; Devi, A. Journal: Journal of materials chemistry Issue: Volume 4:Issue 5(2016) Page Start: 1057 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗