1. Gas-phase reaction mechanism in chemical dry etching using NF3 and remotely discharged NH3/N2 mixture. Issue 51 (20th August 2020) Authors: Matsugi, Akira; Kubota, Shiro; Funato, Yuichi; Miura, Yutaka; Tonari, Kazuhiko Journal: RSC advances Issue: Volume 10:Issue 51(2020) Page Start: 30806 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗