1. A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications. (5th June 2017) Authors: Subramaniam, Srinivas; Huening, Jennifer; Richards, John; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 23:Number 4(2017) Page Start: 769 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Optimization of High Current Xenon Plasma Ion Beams for Applications in Semiconductor Failure Analysis and Development. (August 2014) Authors: Subramaniam, Srinivas; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 20(2014)Supplement 3 Page Start: 296 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Optimization of High Current Xenon Plasma Ion Beams for Applications in Semiconductor Failure Analysis and Development. (August 2014) Authors: Subramaniam, Srinivas; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 20:Number 3(2014:Jun.) Page Start: 296 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Probe Optimization studies For High current Focused Ion Beam Instruments. (23rd September 2015) Authors: Subramaniam, Srinivas; Richards, John; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 1841 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Probe Optimization studies For High current Focused Ion Beam Instruments. (August 2015) Authors: Subramaniam, Srinivas; Richards, John; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 1841 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗