Author/Creator: Shubhakar, K. - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Shubhakar, K.

1. An SEM/STM based nanoprobing and TEM study of breakdown locations in HfO2/SiOx dielectric stacks for failure analysis. Issue 9 (August 2015)

Authors:: Shubhakar, K.; Bosman, M.; Neucheva, O.A.; Loke, Y.C.; Raghavan, N.; Thamankar, R.; Ranjan, A.; O'Shea, S.J.; Pey, K.L.
Journal:: Microelectronics and reliability
Issue:: Volume 55:Issue 9/10(2015)
Page Start:: 1450
Record Type:: Journal Article
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2. Analysis of quantum conductance, read disturb and switching statistics in HfO2 RRAM using conductive AFM. (September 2016)

Authors:: Ranjan, A.; Raghavan, N.; Molina, J.; O'Shea, S.J.; Shubhakar, K.; Pey, K.L.
Journal:: Microelectronics and reliability
Issue:: Volume 64(2016)
Page Start:: 172
Record Type:: Journal Article
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3. Analysis of quantum conductance, read disturb and switching statistics in HfO2 RRAM using conductive AFM. (September 2016)

Authors:: Ranjan, A.; Raghavan, N.; Molina, J.; O'Shea, S.J.; Shubhakar, K.; Pey, K.L.
Journal:: Microelectronics and reliability
Issue:: Volume 64(2016)
Page Start:: 172
Record Type:: Journal Article
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4. Conductive filament formation at grain boundary locations in polycrystalline HfO2 -based MIM stacks: Computational and physical insight. (September 2016)

Authors:: Shubhakar, K.; Mei, S.; Bosman, M.; Raghavan, N.; Ranjan, A.; O'Shea, S.J.; Pey, K.L.
Journal:: Microelectronics and reliability
Issue:: Volume 64(2016)
Page Start:: 204
Record Type:: Journal Article
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5. Conductive filament formation at grain boundary locations in polycrystalline HfO2 -based MIM stacks: Computational and physical insight. (September 2016)

Authors:: Shubhakar, K.; Mei, S.; Bosman, M.; Raghavan, N.; Ranjan, A.; O'Shea, S.J.; Pey, K.L.
Journal:: Microelectronics and reliability
Issue:: Volume 64(2016)
Page Start:: 204
Record Type:: Journal Article
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6. Effects of thermal annealing on the charge localization characteristics of HfO2/Au/HfO2 stack. (June 2016)

Authors:: Feng, Xuan; Dong, Shurong; Wong, Hei; Yu, Danqun; Pey, K.L.; Shubhakar, K.; Lau, W.S.
Journal:: Microelectronics and reliability
Issue:: Volume 61(2016)
Page Start:: 78
Record Type:: Journal Article
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