1. Passivation properties of aluminum oxide films deposited by mist chemical vapor deposition for solar cell applications. (28th July 2015) Authors: Miki, Shohei; Iguchi, Koji; Kitano, Sho; Hayakashi, Koki; Hotta, Yasushi; Yoshida, Haruhiko; Ogura, Atsushi; Satoh, Shin-ichi; Arafune, Koji Journal: Japanese journal of applied physics Issue: Volume 54:Number 8(2015:Aug.)Supplement 1 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Relationship between passivation properties and band alignment in O3-based atomic-layer-deposited AlOx on crystalline Si for photovoltaic applications. (17th July 2015) Authors: Ikeno, Norihiro; Yamashita, Yoshihiro; Oji, Hiroshi; Miki, Shohei; Arafune, Koji; Yoshida, Haruhiko; Satoh, Shin-ichi; Hirosawa, Ichiro; Chikyow, Toyohiro; Ogura, Atsushi Journal: Japanese journal of applied physics Issue: Volume 54:Number 8(2015:Aug.)Supplement 1 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Surface passivation of crystalline silicon by sputtered AlOx/AlNx stacks toward low-cost high-efficiency silicon solar cells. (17th July 2015) Authors: Lee, Hyunju; Ueda, Keigo; Enomoto, Yuya; Arafune, Koji; Yoshida, Haruhiko; Satoh, Shin-ichi; Chikyow, Toyohiro; Ogura, Atsushi Journal: Japanese journal of applied physics Issue: Volume 54:Number 8(2015:Aug.)Supplement 1 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗