1. Chemical Mechanical Polishing and Planarization of Mn-Based Barrier/Ru Liner Films in Cu Interconnects for Advanced Metallization Nodes. (1st January 2017) Authors: Sagi, K. V.; Teugels, L. G.; van der Veen, M. H.; Struyf, Herbert; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 5(2017) Page Start: P259 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Chemical Mechanical Polishing and Planarization of Mn-Based Barrier/Ru Liner Films in Cu Interconnects for Advanced Metallization Nodes. (30th March 2017) Authors: Sagi, K. V.; Teugels, L. G.; van der Veen, M. H.; Struyf, Herbert; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 5(2017) Page Start: P259 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Chemical Mechanical Polishing of Chemical Vapor Deposited Co Films with Minimal Corrosion in the Cu/Co/Mn/SiCOH Patterned Structures. (1st April 2017) Authors: Sagi, K. V.; Teugels, L. G.; van der Veen, M. H.; Struyf, Herbert; Alety, S. R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 5(2017) Page Start: P276 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Chemical Mechanical Polishing of Chemical Vapor Deposited Co Films with Minimal Corrosion in the Cu/Co/Mn/SiCOH Patterned Structures. (1st January 2017) Authors: Sagi, K. V.; Teugels, L. G.; van der Veen, M. H.; Struyf, Herbert; Alety, S. R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 5(2017) Page Start: P276 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Citric Acid as a Complexing Agent in Chemical Mechanical Polishing Slurries for Cobalt Films for Interconnect Applications. (10th August 2017) Authors: Popuri, R.; Sagi, K. V.; Alety, S. R.; Peethala, B. C.; Amanapu, H.; Patlolla, R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 9(2017) Page Start: P594 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Citric Acid as a Complexing Agent in Chemical Mechanical Polishing Slurries for Cobalt Films for Interconnect Applications. (1st January 2017) Authors: Popuri, R.; Sagi, K. V.; Alety, S. R.; Peethala, B. C.; Amanapu, H.; Patlolla, R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 9(2017) Page Start: P594 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects. (1st January 2016) Authors: Sagi, K. V.; Amanapu, H. P.; Alety, S. R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 5(2016) Page Start: P256 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects. (25th February 2016) Authors: Sagi, K. V.; Amanapu, H. P.; Alety, S. R.; Babu, S. V. Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 5(2016) Page Start: P256 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗