1. (Invited) Selective Etch of Si and SiGe for Gate All-Around Device Architecture. (11th September 2015) Authors: Wostyn, Kurt; Sebaai, Farid; Rip, Jens; Mertens, Hans; Witters, Liesbeth; Loo, Roger; Hikavyy, Andriy Yakovitch; Milenin, Alexey; Horiguchi, Naoto; Collaert, Nadine; Thean, Aaron; Mertens, Paul W.; De Gendt, Stefan; Holsteyns, Frank Journal: ECS transactions Issue: Volume 69:Number 8(2015) Page Start: 147 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗