1. Atomic Layer Deposition of TiOx/Al2O3 Bilayer Structures for Resistive Switching Memory Applications1. Issue 7 (28th July 2014) Authors: Zhang, Hehe; Aslam, Nabeel; Reiners, Marcel; Waser, Rainer; Hoffmann‐Eifert, Susanne Other Names: Devi Anjana sponsoringEditor.; Kessels Erwin sponsoringEditor. Journal: Chemical vapor deposition Issue: Volume 20:Issue 7/9(2014:Sep.) Page Start: 282 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗