1. Reactive chemical vapor deposition of heteroepitaxial Ti1−xAlxN films. Issue 12 (2nd March 2018) Authors: Mercier, F.; Shimoda, H.; Lay, S.; Pons, M.; Blanquet, E. Journal: CrystEngComm Issue: Volume 20:Issue 12(2018) Page Start: 1711 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗