1. In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. (31st March 2015) Authors: Pi, T W; Lin, Y H; Fanchiang, Y T; Chiang, T H; Wei, C H; Lin, Y C; Wertheim, G K; Kwo, J; Hong, M Journal: Nanotechnology Issue: Volume 26:Number 16(2015) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗