1. Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass. Issue 6 (11th March 2021) Authors: Weigel, Christoph; Phi, Hai Binh; Denissel, Felix Arthur; Hoffmann, Martin; Sinzinger, Stefan; Strehle, Steffen Journal: Advanced engineering materials Issue: Volume 23:Issue 6(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗