Author/Creator: Pfusterschmied, G. - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Pfusterschmied, G.

1. Growth and characterization of low pressure chemical vapor deposited Si on Si-face 4H–SiC. (15th August 2021)

Authors:: Triendl, F.; Pfusterschmied, G.; Pobegen, G.; Schwarz, S.; Artner, W.; Konrath, J.P.; Schmid, U.
Journal:: Materials science in semiconductor processing
Issue:: Volume 131(2021)
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Record Type:: Journal Article
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2. Impact of Ar+ bombardment of 4H–SiC substrates on Schottky diode barrier heights. (1st March 2021)

Authors:: Pfusterschmied, G.; Triendl, F.; Schneider, M.; Schmid, U.
Journal:: Materials science in semiconductor processing
Issue:: Volume 123(2021)
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Record Type:: Journal Article
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3. Performance of thin AlxOy, SixNy and AlN passivation layers for high temperature SAW device applications. (July 2018)

Authors:: Gillinger, M.; Knobloch, T.; Marković, A.; Pfusterschmied, G.; Schneider, M.; Schmid, U.
Journal:: Materials science in semiconductor processing
Issue:: Volume 81(2018)
Page Start:: 1
Record Type:: Journal Article
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4. Si/4H–SiC heterostructure formation using metal-induced crystallization. (15th June 2021)

Authors:: Triendl, F.; Pfusterschmied, G.; Schwarz, S.; Artner, W.; Schmid, U.
Journal:: Materials science in semiconductor processing
Issue:: Volume 128(2021)
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Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗