1. Physical characterization of sub‐32‐nm semiconductor materials and processes using advanced ion beam–based analytical techniques. (27th March 2012) Authors: Hopstaken, M. J. P.; Pfeiffer, D.; Copel, M.; Gordon, M. S.; Ando, T.; Narayanan, V.; Jagannathan, H.; Molis, S.; Wahl, J. A.; Bu, H.; Sadana, D. K.; Czornomaz, L.; Marchiori, C.; Fompeyrine, J. Journal: Surface and interface analysis Issue: Volume 45:Number 1(2013:Jan.) Page Start: 338 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗