1. Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition. (22nd November 2018) Authors: Woo, Whang Je; Oh, Il-Kwon; Park, Bo-Eun; Kim, Youngjun; Park, Jongseo; Seo, Seunggi; Song, Jeong-Gyu; Jung, Hanearl; Kim, Donghyun; Lim, Jun Hyung; Lee, Sunhee; Kim, Hyungjun Journal: 2D materials Issue: Volume 6:Number 1(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors. Issue 27 (29th June 2018) Authors: Oh, Il-Kwon; Park, Bo-Eun; Seo, Seunggi; Yeo, Byung Chul; Tanskanen, Jukka; Lee, Han-Bo-Ram; Kim, Woo-Hee; Kim, Hyungjun Journal: Journal of materials chemistry Issue: Volume 6:Issue 27(2018) Page Start: 7367 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Comparative study on atomic layer deposition of HfO2via substitution of ligand structure with cyclopentadiene. Issue 4 (19th December 2019) Authors: Park, Sungmin; Park, Bo-Eun; Yoon, Hwi; Lee, Sanghun; Nam, Taewook; Cheon, Taehoon; Kim, Soo-Hyun; Cheon, Hwansung; Im, Sangkyun; Seong, Taegeun; Kim, Hyungjun Journal: Journal of materials chemistry Issue: Volume 8:Issue 4(2019) Page Start: 1344 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Direct observation of leakage currents in a metal–insulator–metal capacitor using in situ transmission electron microscopy. (28th August 2018) Authors: Kim, Kangsik; Kim, Jung Hwa; Park, Bo-Eun; Kim, Hyungjun; Lee, Zonghoon Journal: Nanotechnology Issue: Volume 29:Number 43(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Optimization and device application potential of oxide–metal–oxide transparent electrode structure1. Issue 80 (2nd September 2015) Authors: Kim, Yun Cheol; Lee, Su Jeong; Jung, Hanearl; Park, Bo-Eun; Kim, Hyungjun; Lee, Woong; Myoung, Jae-Min Journal: RSC advances Issue: Volume 5:Issue 80(2015) Page Start: 65094 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Simultaneous improvement of the dielectric constant and leakage currents of ZrO2 dielectrics by incorporating a highly valent Ta5+ element. Issue 36 (3rd September 2018) Authors: Park, Bo-Eun; Oh, Il-Kwon; Park, Jong Seo; Seo, Seunggi; Thompson, David; Kim, Hyungjun Journal: Journal of materials chemistry Issue: Volume 6:Issue 36(2018) Page Start: 9794 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗