1. Substrate control for large area continuous films of monolayer MoS2 by atmospheric pressure chemical vapor deposition. (28th January 2016) Authors: Wang, Shanshan; Pacios, Merce; Bhaskaran, Harish; Warner, Jamie H Journal: Nanotechnology Issue: Volume 27:Number 8(2016) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗