1. On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films. (29th July 2021) Authors: Michiels, M; Hemberg, A; Godfroid, T; Douheret, O; Colaux, J L; Moskovkin, P; Lucas, S; Caillard, A; Thomann, A-L; Laha, P; Terryn, H; Voué, M; Panepinto, A; Snyders, R; Konstantinidis, S Journal: Journal of physics Issue: Volume 54:Number 41(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. TiOx deposited by magnetron sputtering: a joint modelling and experimental study. (20th April 2018) Authors: Tonneau, R; Moskovkin, P; Pflug, A; Lucas, S Journal: Journal of physics Issue: Volume 51:Number 19(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition. (1st February 2021) Authors: Tonneau, R; Moskovkin, P; Muller, J; Melzig, T; Haye, E; Konstantinidis, S; Pflug, A; Lucas, S Journal: Journal of physics Issue: Volume 54:Number 15(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗