1. A thermally erasable silicon oxide layer for molecular beam epitaxy. (20th October 2022) Authors: Hou, Yaonan; Jia, Hui; Tang, Mingchu; Mosberg, Aleksander Buseth; Ramasse, Quentin M; Skandalos, Ilias; Noori, Yasir; Yang, Junjie; Liu, Huiyun; Seeds, Alwyn; Gardes, Frederic Journal: Journal of physics Issue: Volume 55:Number 42(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗